4.7 Article

Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature

Journal

SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 120, Issue -, Pages 109-115

Publisher

ELSEVIER
DOI: 10.1016/j.solmat.2013.08.024

Keywords

Nickel oxide; Electrochromic devices; Thermal evaporation; Chromogenic materials

Funding

  1. Fundacao para a Ciencia e a Tecnologia [PTDC/CTM/099124/2008 - ELECTRA, EXCL/CTM-NAN/0201/2012 - MULTINOX, PEst-C/CTM/LA0025/2013-14]
  2. European Commission [258203, 228144]

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In this work we report the role of thickness on electrochromic behavior of nickel oxide (NiO) films deposited by e-beam evaporation at room temperature on ITO-coated glass. The structure and morphology of films with thicknesses between 100 and 500 nm were analyzed and then correlated with electrochemical response and transmittance modulation when immersed in 0.5 M LiClO4-PC electrolyte. The NiO exhibits an anodic coloration, reaching for the thickest film a transmittance modulation of 66% between colored and bleached state, at 630 nm, with a color efficiency of 55 cm(2) C-1. Very fast switch between states was obtained, where coloration and bleaching times are 3.6 s cm(-2) and 1.4 s cm(-2), respectively. (C) 2013 Elsevier B.V. All rights reserved.

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