Journal
SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 95, Issue 10, Pages 2886-2892Publisher
ELSEVIER
DOI: 10.1016/j.solmat.2011.06.007
Keywords
Thin film solar cells; Light scattering; UV nanoimprint lithography; Pattern fidelity; Texture smoothing; Double texture
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We demonstrate the flexibility of UV nanoimprint lithography for effective light trapping in p-i-n a-Si:H/mu c-Si:H tandem solar cells. A textured polymeric layer covered with pyramidal transparent conductive oxide structures is shown as an ideal system to promote front light scattering and thus enhanced photocurrent. The double structure incorporated into micromorph tandem thin film silicon solar cells is systematically investigated in order to find a relationship between interface morphology, optical properties and photovoltaic characteristics. To prevent the formation of defects during cell growth, a controllable smoothing of the imprinted texture is developed. Modules grown on polymer structures smoothed via multi-replication show excellent performance reaching a photocurrent of 12.6 mA/cm(2) and an efficiency of 12.8%. (C) 2011 Elsevier B.V. All rights reserved.
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