Journal
SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 94, Issue 3, Pages 583-587Publisher
ELSEVIER
DOI: 10.1016/j.solmat.2009.12.001
Keywords
Nano-imprint lithography; Moth-eye; Anti-reflection; Transmittance; Quantum efficiency
Funding
- Korea Ministry of Commerce, Industry and Energy (MOCIE) [2007-N-PV08-P-02, 2008-N-PV08-P-09]
- Seoul Fellowship
- Korea Evaluation Institute of Industrial Technology (KEIT) [2008-N-PV08-P-09] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
- Korea Institute of Industrial Technology(KITECH) [2007-N-PV08-P-02] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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A nanometer scale polymer pattern was formed on the surface of a glass plate by nano-imprint lithography with the aim of reducing the reflection of light at the surface. Since this polymeric nano-pattern is smaller than the wavelength of light, the effective refractive index near the surface changes gradually, and reduces the amount of reflection. Such a nano-pattern was formed on one or both sides of a glass plate, which will be used as the protective layer for solar cell devices. As a result, a solar cell with a both-side patterned glass plate as a protective layer showed up to 2.5% increase (5.14-5.27%) in total conversion efficiency, compared to a solar cell with a bare glass plate. (C) 2009 Elsevier B.V. All rights reserved.
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