Journal
SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 92, Issue 11, Pages 1434-1438Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.solmat.2008.06.005
Keywords
sol-gel; dip-coating; SiO(2)/TiO(2); self-cleaning; antireflection
Funding
- Ministry of Education, Culture, Sports, Science and Technology (MEXT)
- Core Research for Evolutional Science and Technology (CREST) Program
- Japan Science and Technology (JST) Agency
- Japan Society for the Promotion of Science (JSPS)
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We report here that a facile sol-gel dip-coating technique can be used to fabricate a SiO(2)/TiO(2) bilayer film with self-cleaning and antireflection properties. The bottom SiO(2) layer acts as an antireflection coating due to its lower refractive index; the top TiO(2) layer acts as a self-cleaning coating generated from its photocatalysis and photo-induced superhydrophilicity. The maximal transmittance Of SiO(2)/TiO(2) bilayer film at normally incident light can be reached 96.7%, independent of the high refractive index and coverage of TiO(2) nanoparticles. However, the photocatalytic activity of the bilayer film shows a close dependence on coverage of TiO(2) nanoparticles. After illuminated by ultraviolet light, the SiO(2)/TiO(2) bilayer films are superhydrophilic with water contact angle less than 2 degrees, which favors greatly the self-cleaning function of the films. (C) 2008 Elsevier B.V. All rights reserved.
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