4.8 Article

Metal-Etching-Free Direct Delamination and Transfer of Single-Layer Graphene with a High Degree of Freedom

Journal

SMALL
Volume 11, Issue 2, Pages 175-181

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.201401196

Keywords

graphene; direct delamination; metal etching; graphene transistors; transfer printing

Funding

  1. Global Frontier Research Center for Advanced Soft Electronics [2011-0031640, 2011-0031660, 2011-0031638]
  2. Nano-Material Technology Development Program [2012M3A7B4049807]
  3. Basic Research Program of ETRI [13ZE1110]
  4. Ministry of Science, ICT & Future Planning, Republic of Korea [KINC01] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  5. National Research Council of Science & Technology (NST), Republic of Korea [15ZE1100] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  6. National Research Foundation of Korea [2011-0031638, 2012M3A7B4049807, 2011-0031640] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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