4.8 Article

Patterned layers of a semiconducting polymer via imprinting and microwave-assisted grafting

Journal

SMALL
Volume 4, Issue 8, Pages 1176-1182

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.200701251

Keywords

conjugated polymers; imprint lithography; microwave synthesis; polyfluorene; polymer grafting

Funding

  1. UMass Center for Hierarchical Manufacturing (CHM)
  2. NSF Nanoscale Science and Engineering Center [DMI-0531171]
  3. NSF DMR Polymers [DMR 0606391]

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Enhancements in both the rate and extent of grafting of poly (9,9'-n-dihexyl fluorene) (PDHF) onto flat and nanopatterned crosslinked photopolymer films are described. Reactivity of the surfaces toward grafting via the Yamamoto-type Ni(0)-mediated coupling reaction is increased by synthesizing and incorporating 2,7-dibromo-9-fluorenyl methacrylate (DBFM, 2) as a new grafting agent. Varying the concentration of surface-embedded DBFM is shown to control both overall graft formation and fluorescence with a maximum thickness of up to 30 nm and peak emission at 407 nm for 40 wt% loading. In addition, microwave irradiation is introduced as an effective means to drive graft formation and thus allows fabrication of PDHF-functionalized surfaces in as little as 30 min. Both forms of improvement are extended to DBFM-embedded, nanocontact-molded features ranging in size from 100 mu m to 100 nm in width and 60 nm in height. Micro wave-assisted grafting from these patterned surfaces produces fluorescent features as imaged by optical microscopy and a corresponding increase in feature height (is measured by atomic force microscopy.

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