Journal
SMALL
Volume 4, Issue 12, Pages 2214-2221Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.200800228
Keywords
gas detection; microchip fabrication; nanowires; thin-film fractures
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Funding
- German Science Foundation (DFG) [SPP 1165, AD 183-2, CI 14812]
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One-step device fabrication through the integration of nanowires (NWs) into silicon microchips is still under intensive scientific study as it has proved difficult to obtain a reliable and controllable fabrication technique. So far, the techniques are either costly or stiffer from small throughput. Recently, a cost-effective method based on thin-film fracture that can be used as a template for NW fabrication was suggested. Here, a way to integrate NWs between microcontacts is demonstrated. Different geometries of microstructured photoresist formed by using standard photolithography are analyzed. Surprisingly, a very simple stripe geometry is found to yield highly reproducible fracture patterns, which are convenient templates for fault-tolerant NW fabrication. Microchips containing integrated Au, Pd, Ni, and Ti NWs and their suitability for studies of conductivity and oxidation behavior are reported, and their suitability as a hydrogen sensor is investigated. Details of the fabrication process are also discussed.
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