4.7 Article

Versatile control of metal-assisted chemical etching for vertical silicon microwire arrays and their photovoltaic applications

Journal

SCIENTIFIC REPORTS
Volume 5, Issue -, Pages -

Publisher

NATURE PUBLISHING GROUP
DOI: 10.1038/srep11277

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Funding

  1. Zena Technologies, Inc.
  2. Ulsan National Institute of Science and Technology (UNIST) [1.140013.01]
  3. NRF through Basic Science Research Program [NRF-2014R1A1A1004885]
  4. Nano.Material Technology Development from the Ministry of Science, ICT & Future Planning [2009-0082580]

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A systematic study was conducted into the use of metal-assisted chemical etching (MacEtch) to fabricate vertical Si microwire arrays, with several models being studied for the efficient redox reaction of reactants with silicon through a metal catalyst by varying such parameters as the thickness and morphology of the metal film. By optimizing the MacEtch conditions, high-quality vertical Si microwires were successfully fabricated with lengths of up to 23.2 mu m, which, when applied in a solar cell, achieved a conversion efficiency of up to 13.0%. These solar cells also exhibited an open-circuit voltage of 547.7 mV, a short-circuit current density of 33.2 mA/cm(2), and a fill factor of 71.3% by virtue of the enhanced light absorption and effective carrier collection provided by the Si microwires. The use of MacEtch to fabricate high-quality Si microwires therefore presents a unique opportunity to develop cost-effective and highly efficient solar cells.

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