Journal
SENSORS AND ACTUATORS B-CHEMICAL
Volume 148, Issue 1, Pages 227-232Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.snb.2010.05.018
Keywords
Atomic layer deposition; Tin dioxide; Metal-oxide gas sensor; Microhotplate gas sensor
Funding
- Nordic Innovation Centre
- Academy of Finland
- European Social Fund [S 10148]
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We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed. (C) 2010 Elsevier B.V. All rights reserved.
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