4.7 Article

Surface and bulk properties of sputter deposited undoped and Sb-doped SnO2 thin films

Journal

SENSORS AND ACTUATORS B-CHEMICAL
Volume 139, Issue 2, Pages 665-672

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.snb.2009.03.067

Keywords

Tin oxide; Doping; Sputter deposition; Thin films; Surface potentials; Photoelectron spectroscopy; Electrical transport measurement

Funding

  1. German Science Foundation [KL1225/4]

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Electronic surface and bulk properties of sputter deposited polycrystalline intrinsic and Sb-doped SnO2 thin films have been investigated by a combination of in situ photoelectron spectroscopy, electrical four-point conductivity, and optical transmission measurements. The work function and ionization potential of the polycrystalline films increase with increasing oxygen content in the sputtergas by similar to 1.4 and similar to 1 eV, respectively. The changes are explained by the different surface terminations known for single crystalline SnO2. Comparison of surface and bulk Fermi level positions indicates flat band situation for most cases but the presence of a depletion layer for Sb-doped films deposited under oxidizing conditions. Large changes of electrical conductivity depending on the oxygen content in the sputter gas were observed for undoped SnO2 which can be understood in terms of different concentrations of oxygen vacancies. In contrast, literally no changes occur for SnO2:Sb, which is attributed to the too high formation energy of compensating defects like oxygen interstitials or Sn vacancies. (c) 2009 Elsevier B.V. All rights reserved.

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