Journal
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 26, Issue 3, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0268-1242/26/3/034001
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Funding
- Ministry of Knowledge Economy/Korea Evaluation Institute of Industrial Technology [10035225]
- Korea Evaluation Institute of Industrial Technology (KEIT) [10035225] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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Flexible organic light emitting diode (OLED) will be the ultimate display technology to customers and industries in the near future but the challenges are still being unveiled one by one. Thin-film encapsulation (TFE) technology is the most demanding requirement to prevent water and oxygen permeation into flexible OLED devices. As a polymer substrate does not offer the same barrier performance as glass, the TFE should be developed on both the bottom and top side of the device layers for sufficient lifetimes. This work provides a review of promising thin-film barrier technologies as well as the basic gas diffusion background. Topics include the significance of the device structure, permeation rate measurement, proposed permeation mechanism, and thin-film deposition technologies (Vitex system and atomic layer deposition (ALD)/molecular layer deposition (MLD)) for effective barrier films.
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