Effects of applied pressure on the densification rates in current-activated pressure-assisted densification (CAPAD) of nanocrystalline materials

We discuss the role of applied pressure on the densification rates of nanocrystalline materials (aluminum, silicon and zirconia) using current-activated pressure-assisted densification. Varying pressure in the 35-106 MPa range does not significantly affect the temperature at which the maximum densification rate (rho(Max)) occurs, suggesting that the densification mechanism(s) do not change. However, the pressure dependence of rho(Max), is remarkable for all three materials, and can be as high as 120% in the case of Si when increasing the pressure by 30%. (C) 2014 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.