4.7 Article

Thickness effects on the lithiation of amorphous silicon thin films

Journal

SCRIPTA MATERIALIA
Volume 64, Issue 4, Pages 307-310

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.scriptamat.2010.10.003

Keywords

Thin films; Electrochemistry; Internal stresses; Lithium-ion batteries

Funding

  1. NSF [CMMI-1000822, DMR-0520651]
  2. GM/Brown CRL on Computational Materials Science
  3. Directorate For Engineering
  4. Div Of Civil, Mechanical, & Manufact Inn [1000822] Funding Source: National Science Foundation

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The lithiation of thin film Si was investigated in an electrochemical cell, using in situ wafer curvature to monitor the evolution of in-plane stresses. Increasing the initial film thickness from 50 to 250 nm led to decreases in both the nominal flow stress and the Li capacity. These observations are consistent with relatively slow Li diffusion. The corresponding concentration gradients should have a substantial effect on the deformation and viscous flow that occur in lithiated Si. (C) 2010 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

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