4.7 Article

High-density carrier-accumulated and electrically stable oxide thin-film transistors from ion-gel gate dielectric

Related references

Note: Only part of the references are listed.
Article Materials Science, Multidisciplinary

The Influence of Fluorinated Silicon Nitride Gate Insulator on Positive Bias Stability toward Highly Reliable Amorphous InGaZnO Thin-Film Transistors

Haruka Yamazaki et al.

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2014)

Article Physics, Applied

Hydrogen passivation of electron trap in amorphous In-Ga-Zn-O thin-film transistors

Yuichiro Hanyu et al.

APPLIED PHYSICS LETTERS (2013)

Article Physics, Applied

Origin of subgap states in amorphous In-Ga-Zn-O

Wolfgang Koerner et al.

JOURNAL OF APPLIED PHYSICS (2013)

Article Multidisciplinary Sciences

Electric double-layer capacitance between an ionic liquid and few-layer graphene

Eri Uesugi et al.

SCIENTIFIC REPORTS (2013)

Article Chemistry, Physical

Ionic Liquids for Electrolyte-Gating of ZnO Field-Effect Transistors

S. Thiemann et al.

JOURNAL OF PHYSICAL CHEMISTRY C (2012)

Article Engineering, Electrical & Electronic

High-Performance Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors With HfOxNy/HfO2/HfOxNy Tristack Gate Dielectrics

Longyan Yuan et al.

IEEE ELECTRON DEVICE LETTERS (2011)

Article Chemistry, Physical

Liquid-gated interface superconductivity on an atomically flat film

J. T. Ye et al.

NATURE MATERIALS (2010)

Review Materials Science, Multidisciplinary

Material characteristics and applications of transparent amorphous oxide semiconductors

Toshio Kamiya et al.

NPG ASIA MATERIALS (2010)

Article Chemistry, Multidisciplinary

High-Density Carrier Accumulation in ZnO Field-Effect Transistors Gated by Electric Double Layers of Ionic Liquids

Hongtao Yuan et al.

ADVANCED FUNCTIONAL MATERIALS (2009)

Article Thermodynamics

Experimental measurement of the hygroscopic grade on eight imidazolium based ionic liquids

S. Cuadrado-Prado et al.

FLUID PHASE EQUILIBRIA (2009)

Article Engineering, Electrical & Electronic

All oxide transparent MISFET using high-k dielectrics gates

K Nomura et al.

MICROELECTRONIC ENGINEERING (2004)