Journal
SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS
Volume 15, Issue 3, Pages -Publisher
TAYLOR & FRANCIS LTD
DOI: 10.1088/1468-6996/15/3/035013
Keywords
single crystal diamond; chemical mechanical polishing; diamond polishing
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Funding
- Marie Curie Actions for his intra-EU fellowship
- UK Engineering and Physical Sciences Research Council (EPSRC) under the grant 'Nanocrystalline diamond for Micro-Electro-MechanicalSystems' [EP/J009814/1]
- EPSRC [EP/J009814/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/J009814/1, 1225498] Funding Source: researchfish
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Diamond is one of the hardest and most difficult to polish materials. In this paper, the polishing of {111} and {100} single crystal diamond surfaces by standard chemical mechanical polishing, as used in the silicon industry, is demonstrated. A Logitech Tribo Chemical Mechanical Polishing system with Logitech SF1 Syton and a polyurethane/polyester polishing pad was used. A reduction in roughness from 0.92 to 0.23 nm root mean square and 0.31 to 0.09 nm rms for {100} and {111} samples respectively was observed.
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