4.8 Article

Growth of Uniformly Oriented Silica MFI and BEA Zeolite Films on Substrates

Journal

SCIENCE
Volume 334, Issue 6062, Pages 1533-1538

Publisher

AMER ASSOC ADVANCEMENT SCIENCE
DOI: 10.1126/science.1212472

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Funding

  1. Korea Center for Artificial Photosynthesis, at Sogang University
  2. Ministry of Education of Science and Technology through the National Research Foundation of Korea (NRFK) [NRF-2009-C1AAA001-2009-0093879]
  3. NRFK
  4. National Research Foundation of Korea [2009-0093886, 핵06A3004] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Applications of zeolite films benefit from alignment of the integrated channels, but methods for film growth have nearly always introduced orientational randomization in the direction normal to the substrate. We now report facile methods to grow silicalite-1 films and pure silica beta zeolite films on substrates with straight or sinusoidal channels positioned uniformly upright at a thickness of up to 8 micrometers. Precise gel compositions and processing temperatures are critical to promote secondary growth on pre-formed oriented crystal monolayers while suppressing self-crystallization in the bulk medium. Preliminary results highlight the potential of these uniformly oriented films in the nonlinear optical response and separation of xylene isomers.

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