Related references
Note: Only part of the references are listed.Atomic Layer Deposition of Noble Metals and Their Oxides
Jani Hamalainen et al.
CHEMISTRY OF MATERIALS (2014)
Chemical vapour-phase deposition of ruthenium-containing thin films
V. Yu Vasilyev et al.
RUSSIAN CHEMICAL REVIEWS (2014)
Design, synthesis and ALD assessment of organometallic precursors for semiconductor applications
C. Dussarat
ATOMIC LAYER DEPOSITION APPLICATIONS 10 (2014)
Synthesis and microstructure of iridium coatings on carbon fibers
N. I. Baklanova et al.
CARBON (2013)
'Old Chemistries' for new applications: Perspectives for development of precursors for MOCVD and ALD applications
Anjana Devi
COORDINATION CHEMISTRY REVIEWS (2013)
Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials
Sang Woon Lee et al.
COORDINATION CHEMISTRY REVIEWS (2013)
Metal ALD and pulsed CVD: Fundamental reactions and links with solution chemistry
David J. H. Emslie et al.
COORDINATION CHEMISTRY REVIEWS (2013)
Precursor design and reaction mechanisms for the atomic layer deposition of metal films
Karla Bernal Ramos et al.
COORDINATION CHEMISTRY REVIEWS (2013)
Precursors as enablers of ALD technology: Contributions from University of Helsinki
Timo Hatanpaa et al.
COORDINATION CHEMISTRY REVIEWS (2013)
Mechanisms and reactions during atomic layer deposition on polymers
Gregory N. Parsons et al.
COORDINATION CHEMISTRY REVIEWS (2013)
Preparation of thin films of platinum group metals by pulsed MOCVD. I. Deposition of Ir layers
N. V. Gelfond et al.
JOURNAL OF STRUCTURAL CHEMISTRY (2012)
Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications
Tomi Ryynanen et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2012)
Effect of hydrogen plasma on growth of Ir thin film by plasma-enhanced hybrid atomic layer deposition
Moo Ryul Kim et al.
MICROELECTRONIC ENGINEERING (2012)
Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
Sang In Song et al.
SURFACE & COATINGS TECHNOLOGY (2012)
Effect of interface layer on growth behavior of atomic-layer-deposited Ir thin film as novel Cu diffusion barrier
Bum Ho Choi et al.
APPLIED SURFACE SCIENCE (2011)
In situ Reaction Mechanism Studies on Atomic Layer Deposition of Ir and IrO2 from Ir(acac)3
Kjell Knapas et al.
CHEMISTRY OF MATERIALS (2011)
Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperatures
Jani Hamalainen et al.
JOURNAL OF MATERIALS CHEMISTRY (2011)
Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
Seong-Jun Jeong et al.
SURFACE & COATINGS TECHNOLOGY (2011)
Atomic-layer-deposited Ir thin film as a novel diffusion barrier layer in Cu interconnection
Yong Hwan Lim et al.
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 3 (2011)
Atomic Layer Deposition of Ir-Pt Alloy Films
Steven T. Christensen et al.
CHEMISTRY OF MATERIALS (2010)
Synthesis of nanoporous activated iridium oxide films by anodized aluminum oxide templated atomic layer deposition
David J. Comstock et al.
ELECTROCHEMISTRY COMMUNICATIONS (2010)
Deposition of tin oxide, iridium and iridium oxide films by metal-organic chemical vapor deposition for electrochemical wastewater treatment
Songsak Klamklang et al.
JOURNAL OF APPLIED ELECTROCHEMISTRY (2010)
(MeCp)Ir(CHD) and molecular oxygen as precursors in atomic layer deposition of iridium
Jani Hamalainen et al.
JOURNAL OF MATERIALS CHEMISTRY (2010)
STRUCTURE OF Ir AND Ir-Al2O3 COATINGS OBTAINED BY CHEMICAL VAPOR DEPOSITION IN THE PRESENCE OF OXYGEN
N. V. Gelfond et al.
JOURNAL OF STRUCTURAL CHEMISTRY (2010)
Crystal Structure of Iridium(III) trans-Trifluoroacetylacetonate
K. V. Zherikova et al.
JOURNAL OF STRUCTURAL CHEMISTRY (2010)
Atomic Layer Deposition of Iridium Thin Films by Consecutive Oxidation and Reduction Steps
Jani Hamalainen et al.
CHEMISTRY OF MATERIALS (2009)
Thermal stability of iridium coating prepared by MOCVD
Wenbin Yang et al.
INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS (2009)
Structure of Ir-Al2O3 coatings obtained by chemical vapor deposition in the hydrogen atmosphere
N. V. Gelfond et al.
JOURNAL OF STRUCTURAL CHEMISTRY (2009)
CRYSTAL STRUCTURE OF (ACETYLACETONATO) (DICARBONYL) IRIDIUM(I)
K. V. Zherikova et al.
JOURNAL OF STRUCTURAL CHEMISTRY (2009)
Crystal structure of (5-methylcyclopentadienyl)-(1,5-cyclooctadiene) iridium(I)
K. V. Zherikova et al.
JOURNAL OF STRUCTURAL CHEMISTRY (2009)
High-temperature metal coating for modification of photonic band edge position
Timothy A. Walsh et al.
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS (2009)
Vapor pressure of some volatile iridium(I) compounds with carbonyl, acetylacetonate and cyclopentadienyl ligands
N. B. Morozova et al.
JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY (2009)
Coating of Highly Porous Fiber Matrices by Atomic Layer Deposition
Marianna Kemell et al.
CHEMICAL VAPOR DEPOSITION (2008)
Atomic layer deposition of iridium oxide thin films from Ir(acac)3 and ozone
Jani Hamalainen et al.
CHEMISTRY OF MATERIALS (2008)
Surface Selective Growth of Ruthenium Films under Low-Temperature Pulsed CVD Conditions
Vladislav Yu. Vasilyev et al.
ELECTROCHEMICAL AND SOLID STATE LETTERS (2008)
Phase control of iridium and iridium oxide thin films in atomic layer deposition
Sung-Wook Kim et al.
JOURNAL OF APPLIED PHYSICS (2008)
Nucleation and Growth of Pulsed CVD Ru Films from Tricarbonyl[eta(4)-cyclohexa-1,3-diene]ruthenium
Vladislav Yu. Vasilyev et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2008)
Processing of Iridium and Iridium Alloys METHODS FROM PURIFICATION TO FABRICATION
E. K. Ohriner
PLATINUM METALS REVIEW (2008)
Selective-area atomic layer deposition with microcontact printed self-assembled octadecyltrichlorosilane monolayers as mask layers
Elina Farm et al.
THIN SOLID FILMS (2008)
Iridium Thin Films Deposited by Liquid Delivery MOCVD using Ir(EtCp)(1,5-COD) with Toluene Solvent
Yves Ritterhaus et al.
CHEMICAL VAPOR DEPOSITION (2007)
Overview of coating growth mechanisms in MOCVD processes as observed in Pt group metals
Igor K. Igumenov et al.
CHEMICAL VAPOR DEPOSITION (2007)
Approach to control deposition of ultra thin films from metal organic precursors: Ru deposition
Igor K. Igumenov et al.
SURFACE & COATINGS TECHNOLOGY (2007)
New MOCVD precursor for iridium thin films deposition
Xin Yan et al.
MATERIALS LETTERS (2007)
Ir/oxide/cellulose composites for catalytic purposes prepared by atomic layer deposition
Marianna Kemell et al.
CHEMICAL VAPOR DEPOSITION (2006)
Self-assembled octadecyltrimethoxysilane monolayers enabling selective-area atomic layer deposition of iridium
Elina Farm et al.
CHEMICAL VAPOR DEPOSITION (2006)
Iridium metal thin films and patterned IrO2 nanowires deposited using iridium(I) carbonyl precursors
Yao-Lun Chen et al.
CHEMICAL VAPOR DEPOSITION (2006)
Low temperature deposition of metal films by metal chloride reduction chemical vapor deposition
Y Ogura et al.
SURFACE & COATINGS TECHNOLOGY (2006)
Iridium barriers for direct copper electrodeposition in damascene processing
D Josell et al.
ELECTROCHEMICAL AND SOLID STATE LETTERS (2006)
Structural and morphological characterization of iridium coatings grown by MOCVD
YF Hua et al.
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY (2005)
Synthesis of metallic iridium oxide nanowires via metal organic chemical vapor deposition
FY Zhang et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS (2005)
Sputtered iridium oxide films as charge injection material for functional electrostimulation
E Slavcheva et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2004)
Atomic layer deposition of iridium thin films
T Aaltonen et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2004)
Chemical vapor deposition of iridium, platinum, rhodium and palladium
JRV Garcia et al.
MATERIALS TRANSACTIONS (2003)
Reaction mechanism studies on atomic layer deposition of ruthenium and platinum
T Aaltonen et al.
ELECTROCHEMICAL AND SOLID STATE LETTERS (2003)
High-density plasma etching of iridium thin films in a Cl2/O2/Ar plasma
CW Chung et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2003)
Iridium coatings grown by metal-organic chemical vapor deposition in a hot-wall CVD reactor
F Maury et al.
SURFACE & COATINGS TECHNOLOGY (2003)
Optical constants and roughness study of dc magnetron sputtered iridium films
L Yan et al.
JOURNAL OF APPLIED PHYSICS (2002)
Atomic layer deposition (ALD):: from precursors to thin film structures
M Leskelä et al.
THIN SOLID FILMS (2002)
X-ray characterization of annealed iridium films
S Kohli et al.
JOURNAL OF APPLIED PHYSICS (2002)
Chemical mechanical polishing of iridium and iridium oxide for damascene processes
G Mainka et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2001)
Electrodeposition of iridium-ruthenium alloys from chloride melts: the structure of the deposits
NA Saltykova et al.
RUSSIAN JOURNAL OF ELECTROCHEMISTRY (2001)
Iridium precursor pyrolysis and oxidation reactions and direct liquid injection chemical vapor deposition of iridium films
JP Endle et al.
THIN SOLID FILMS (2001)
Chronic neural stimulation with thin-film, iridium oxide electrodes
JD Weiland et al.
IEEE TRANSACTIONS ON BIOMEDICAL ENGINEERING (2000)
Precursor chemistry and film growth with (methylcyclopentadienyl) (1,5-cyclooctadiene)iridium
YM Sun et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2000)
Share Paper
