4.5 Article

Design and optimization of a light-emitting diode projection micro-stereolithography three-dimensional manufacturing system

Journal

REVIEW OF SCIENTIFIC INSTRUMENTS
Volume 83, Issue 12, Pages -

Publisher

AIP Publishing
DOI: 10.1063/1.4769050

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Funding

  1. U.S. Department of Energy by Lawrence Livermore National Laboratory [DE-AC52-07NA27344]
  2. LDRD Strategic Initiative [11-SI-005]

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The rapid manufacture of complex three-dimensional micro-scale components has eluded researchers for decades. Several additive manufacturing options have been limited by either speed or the ability to fabricate true three-dimensional structures. Projection micro-stereolithography (P mu SL) is a low cost, high throughput additive fabrication technique capable of generating three-dimensional microstructures in a bottom-up, layer by layer fashion. The P mu SL system is reliable and capable of manufacturing a variety of highly complex, three-dimensional structures from micro-to meso-scales with microscale architecture and submicron precision. Our P mu SL system utilizes a reconfigurable digital mask and a 395 nm light-emitting diode (LED) array to polymerize a liquid monomer in a layer-by-layer manufacturing process. This paper discusses the critical process parameters that influence polymerization depth and structure quality. Experimental characterization and performance of the LED-based P mu SL system for fabricating highly complex three-dimensional structures for a large range of applications is presented. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4769050]

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