Journal
REVIEW OF SCIENTIFIC INSTRUMENTS
Volume 79, Issue 2, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.2804627
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Funding
- Korea Institute of Industrial Technology(KITECH) [2006-C-CC02-P-05-0-000, 2006-C-CC02-P-05] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
- National Research Foundation of Korea [과06B2406] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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The deposition of polycrystalline ZnO film on a cold substrate was performed by using a plasmatron in rough vacuum condition. Low energy oxygen ion beam generated by a cold cathode ion source was introduced during the deposition process. The change of film property on the ion beam energy was checked. It is shown that irradiation by 200 eV ions improves crystalline structure of the film. Increasing of ion beam energy up to 400 eV leads to the degradation of a crystalline structure and decreases the deposition rate. (C) 2008 American Institute of Physics.
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