Journal
RENEWABLE ENERGY
Volume 33, Issue 2, Pages 226-231Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.renene.2007.05.022
Keywords
plasma enhanced chemical vapor deposition; diamond-like carbon film; antireflection coating; annealing treatment; electrical properties
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In addition to its similarity to genuine diamond film, diamond-like carbon (DLC) film has many advantages, including its wide band gap and variable refractive index. Therefore, as one of the diverse applications, DLC film can be utilized as a protective coating for IR windows and an anti-reflective coating for solar cells. For this study, DLC films were prepared by the radio frequency-plasma enhanced chemical vapor deposition (RF-PECVD) method on silicon substrates using methane (CH4) and hydrogen (H-2) gas. We examined the effects of the post-annealing temperature and the annealing ambient on structural, electrical and optical properties of DLC films. The films were annealed at temperatures ranging from 300 to 900 degrees C in steps of 200 degrees C using rapid thermal annealing equipment in nitrogen ambients. The thickness of the film was observed by scanning electron microscopy (SEM) and surface profile analysis. The variation of structure according to the annealing treatment was examined using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HRTEM). The reflectance of DLC thin film was investigated by UV-vis spectrometry and its electrical properties were investigated using a four point probe and I-Vmeter. The carrier lifetime of the film was also checked. (C) 2007 Elsevier Ltd. All rights reserved.
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