Journal
PURE AND APPLIED CHEMISTRY
Volume 82, Issue 6, Pages 1247-1258Publisher
WALTER DE GRUYTER GMBH
DOI: 10.1351/PAC-CON-09-10-43
Keywords
coating adhesion; high-density microstructure films; high-power impulse magnetron sputtering; local epitaxial growth; physical vapor deposition
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Funding
- EPSRC [EP/D049202/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/D049202/1] Funding Source: researchfish
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High-power impulse magnetron sputtering (HIPIMS) was introduced in the late 1990s as a unique physical vapor deposition method. The technology utilizes magnetron sputtering cathodes and high peak power density of up to 3 kW cm(-2) on the target. The plasma produces a metal flux with high degree of ionization. HIPIMS has been successfully used as a substrate pretreatment method to enhance coating adhesion by promoting local epitaxial growth. As a deposition technology, HIPIMS produces high-density microstructure films. It has been industrialized and has successful applications in hard, electronic, and optical coatings.
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