4.3 Article Proceedings Paper

Macroscopic control of plasma polymerization processes

Journal

PURE AND APPLIED CHEMISTRY
Volume 80, Issue 9, Pages 1893-1900

Publisher

WALTER DE GRUYTER GMBH
DOI: 10.1351/pac200880091893

Keywords

plasma deposition; monomer; reaction parameter; deposition rate; process engineering

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Plasma polymerization covers a broad range of plasma deposits from soft to hard coatings. Nanoscale coatings are formed within a dry and eco-friendly process on different Substrate materials and structures. To gain a deeper insight into plasma polymerization, a macroscopic approach using the concept of chemical quasi-equilibria might be useful. Following this macroscopic approach, the reaction parameter power input per gas flow WIF, which represents the specific energy invested per particle within the active plasma zone, solely determines the mass deposition rate. Hence, plasma polymerization can be described by measuring the deposited mass and examining the power input and gas flow which contributes to it. Thus, the control, investigation, and up-scaling of plasma polymerization processes are enabled. Different examples are given to make use of the macroscopic approach.

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