Journal
PROGRESS IN QUANTUM ELECTRONICS
Volume 34, Issue 4, Pages 173-190Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.pquantelec.2010.03.001
Keywords
Nanopatterning; Interferometric lithography; EUV lasers
Categories
Funding
- NSF ERC for Extreme Ultraviolet Science and Technology [EEC-0310717]
- NSF [ECCS 0901806]
- Div Of Electrical, Commun & Cyber Sys
- Directorate For Engineering [0901806] Funding Source: National Science Foundation
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Compact extreme ultraviolet (EUV) lasers with table top footprints which can be easily installed in a small laboratory environment, had enabled in the last years applications that so far had been restricted to large synchrotron facilities. The high brightness and degree of coherence of these laser sources make them a good alternative for applications where a coherent illumination is required. One of these applications is nano-photolithography realized by interferometric or holographic lithography. This paper describes the advances and capabilities of compact photolithographic systems based on table top EUV lasers. (C) 2010 Elsevier Ltd. All rights reserved.
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