Journal
PROGRESS IN PHOTOVOLTAICS
Volume 21, Issue 5, Pages 1056-1062Publisher
WILEY-BLACKWELL
DOI: 10.1002/pip.2203
Keywords
solar cell; anti-reflection; nano-pattern; UV nanoimprint; hot-embossing; moth-eye pattern; superhydrophobicity; external quantum efficiency
Funding
- R&D program for Industrial Core Technology through the Korea Evaluation Institute of Industrial Technology
- Ministry of Knowledge Economy in Korea [10040225]
- Technology Innovation Program
- Ministry of Knowledge Economy [20103020010020-11-2-100]
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A moth-eye anti-reflective structure was fabricated by hot-embossing and UV nanoimprint lithography on a solar cell protective film to suppress the reflection of incident light. Moreover, a superhydrophobic surface was developed by reducing the surface energy by forming a hydrophobic self-assembled monolayer coating on an anti-reflective structured resin surface. Therefore, the transmittance of incident light was increased by the anti-reflective structure. As a result, the solar cell efficiency was enhanced and the total accumulated electrical energy generated by a solar cell with a nano-patterned polymeric film was increased. The efficiency of each solar cell was evaluated by an analysis of its I-V characteristics using a solar simulator, and the external quantum efficiency according to the wavelength of incident light was analyzed by using an incident photon-to-current conversion efficiency system. Finally, the enhancement of the generated power was confirmed by a field test and a power charging experiment. Copyright (c) 2012 John Wiley & Sons, Ltd.
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