4.7 Article

Moth-eye antireflection coating fabricated by nanoimprint lithography on 1eV dilute nitride solar cell

Journal

PROGRESS IN PHOTOVOLTAICS
Volume 21, Issue 5, Pages 1158-1162

Publisher

WILEY
DOI: 10.1002/pip.2191

Keywords

moth eye; antireflection coating; nanoimprint lithography; III-V solar cell; dilute nitride solar cell

Funding

  1. Finnish Funding Agency for Technology and Innovation (TEKES) project Solar III-V [40120/09]
  2. National Graduate School in Nanoscience (NGS-NANO)
  3. Vilho, Yrjo and Kalle Vaisala Foundation
  4. Industrial Research Fund at Tampere University of Technology (Tuula and Yrjo Neuvo fund)

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We report on the performance of biomimicked antireflection coating applied to dilute nitride solar cell. The coating consists of nanostructures replicating the moth-eye geometry and has been fabricated by nanoimprint lithography directly within the window layer covering the dilute nitride absorbing junction. The mean reflectivity within the spectral range of 320-1800nm remains under 5% for incident angles up to 45 degrees. The effect of the coating on the cell performance was assessed by measuring the current-voltage characteristics under simulated solar illumination. A clear performance increase was identified when comparing a solar cell with the moth-eye coating with a solar cell having a standard SiNx/SiO2 coating. Copyright (c) 2012 John Wiley & Sons, Ltd.

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