Journal
PROGRESS IN ORGANIC COATINGS
Volume 69, Issue 4, Pages 396-401Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.porgcoat.2010.08.002
Keywords
Plasma polymerization; Polypyrrole; HRTEM
Funding
- University of Delhi
- IUAC [UFUP 42313]
- Department of Science and Technology (DST) under DST-SERC
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Plasma polymerized thin film of conducting polypyrrole were deposited at room temperature by plasma enhanced chemical vapor deposition method using pyrrole monomer as precursor. The radio frequency (RF: 13.56 MHz, power supply: 30W) was applied at constant argon gas pressure for the formation of plasma. The as grown thin films of polypyrrole have been characterized by ellipsometry, Fourier transform infrared spectroscopy (FTIR), UV-vis spectroscopy, atomic force microscopy (AFM), X-ray diffractometry (XRD) and high-resolution transmission electron microscopy ( HRTEM). UV-vis spectra showed the optical energy band gap of 2.3 eV. XRD pattern of plasma polymerized polypyrrole has revealed a clear peak at inter-planer separation of 0.687 nm. It was also noticed by HRTEM analysis that the distinguished reflection at d = 0.687 nm has a broadening effect that may be correlated with the crystallinity of the material. (C) 2010 Elsevier B.V. All rights reserved.
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