Journal
POLYMER TESTING
Volume 27, Issue 1, Pages 75-83Publisher
ELSEVIER SCI LTD
DOI: 10.1016/j.polymertesting.2007.09.002
Keywords
surface modification; X-ray photoelectron spectroscopy (XPS); contact angle; atomic force microscopy (AFM); low-pressure plasma; polyurethane film
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In this work, low-pressure nitrogen plasma has been used to improve wettability in a polyurethane film. Evaluation of wettability changes has been carried out using contact angle measurements. Furthermore, plasma-treated films have been subjected to air aging to evaluate the extent of hydrophobic recovery. X-ray photoelectron spectroscopy (XPS) has been used to study surface functionalization; surface topography changes related with the etching mechanism have been followed by scanning electron microscopy (SEM), atomic force microscopy (AFM) and weight loss study. The results show a considerable improvement in surface wettability even for short exposure times, as observed by a remarkable decrease in contact angle values. The aging study shows a partial hydrophobic recovery due to the re-arrangement of polar species and migration of low molecular oxidized material (LMWOM). In addition to surface activation, SEM and AFM analyses show slight changes in surface topography as a consequence of the plasma-etching mechanism. (C) 2007 Elsevier Ltd. All rights reserved.
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