Epoxy silicone based matrix materials for two-photon patterning of optical waveguides

3D polymeric optical waveguides play an intrinsic role in a rapidly developing area of broadband communications. Advances in the field of electronics means there is a greater demand for higher speeds, larger data storage, smaller components and the improvement in the design of integrated optical circuits. Two-photon photopolymerisation (2PP) is a promising three-dimensional microfabrication technique, which can be used to produce structures in the sub-micron region. With the use of near-infrared (NIR) lasers, 3D optical waveguides can be fabricated in polymer-based matrix materials, based on the increase of the refractive index in the vicinity of the laser focus. The development of a new polysiloxane material, used in the study of the integration of optical interconnects on printed circuit boards is presented. The desirable properties of epoxy functional silicones crosslinked with diamines deem them suitable for such applications. An epoxy terminated polysiloxane: crosslinked with an aminopropyl disiloxane has been developed as a suitable material for the fabrication of optical waveguides by two-photon absorption (TPA). The material fulfils a number of requirements including a good refractive index contrast between the matrix material and inscribed waveguide, full flexibility and high thermal stability. The matrix material was characterised by Fourier transform infrared spectroscopy (FUR) and thermal gravimetric analysis (TGA) The optical waveguides were characterised by phase contrast microscopy, and were directly integrated onto specially designed PCB's by correctly positioning waveguide bundles between optoelectronic components using TPA, making it possible to detect transmitted photocurrents. (C) 2011 Elsevier Ltd. All rights reserved.