Journal
PLASMONICS
Volume 6, Issue 3, Pages 565-580Publisher
SPRINGER
DOI: 10.1007/s11468-011-9237-0
Keywords
Plasmonic nanolithography; Contact nanolithography; Planar lens imaging nanolithography
Funding
- National Natural Science Foundation of China [90923036, 609770410, 60877021, 61077010]
- Chinese Academy of Sciences
Ask authors/readers for more resources
Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available