Journal
PLASMA PROCESSES AND POLYMERS
Volume 7, Issue 9-10, Pages 836-845Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.201000024
Keywords
dielectric barrier discharges (DBD); PEMFC; plasma polymerization; polystyrene; sulfonated polystyrene; XPS
Funding
- FNRS (FRFC) [2.4543.04]
- F.R.I.A. (Belgium)
- Belgian Federal Government IAP
Ask authors/readers for more resources
Thin sulfonated polystyrene films were prepared by high pressure PECVD of styrene and trifluoromethane sulfonic acid using a DBD. Argon or helium was used as carrier gas. The chemical composition of the pp-sulfonated polystyrene was investigated by XPS, SSIMS, and FTIR. XPS shows that the content in sulfonated groups of the films deposited in the discharge can be tuned by varying the temperature of the acid monomer or by improving the HF voltage. Therefore, the films obtained are rich in ionizable groups (more than Nafion). TOF-SSIMS and FTIR spectra allow to confirm the presence of sulfonic groups (observed on S2p XPS spectra) grafted in the polystyrene matrix.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available