Journal
PLASMA PROCESSES AND POLYMERS
Volume 6, Issue -, Pages S543-S547Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.200931202
Keywords
coatings; deposition rate; films; HiPIMS; temperature; XRD
Funding
- Engineering and Physical Sciences Research Council [EP/F005296/1, EP/F003951/1, EP/F004605/1] Funding Source: researchfish
- EPSRC [EP/F003951/1, EP/F004605/1, EP/F005296/1] Funding Source: UKRI
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The thermal energy flux delivered to the substrate position was measured for continuous-dc, pulsed dc- and high-power impulse magnetron sputtering (HiPIMS) magnetron discharges at the same time-averaged discharge powers. These values were subsequently normalised for measured deposition rates. Titanium coatings were grown under the same process conditions and analysed for alterations in crystal structure via X-ray diffraction. The HiPIMS discharges were found to deliver a significantly lower normalised thermal energy flux to the substrate than both continuous-dc and pulsed-dc sputtering, which is of potential benefit in coating temperature-sensitive substrates; whilst also enabling frequency-dependent modification of film properties resulting from the ionised deposition flux inherent in this process.
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