Carbon nanowalls growth by radiofrequency plasma-beam-enhanced chemical vapor deposition

We report the remote growth of carbon nanowalls in a plasma beam sustained by an expanding argon radiofrequency discharge and injected with a small amount of acetylene in the presence of hydrogen as active gas. The growth process was investigated by varying the mass flow rates, ratio and nature of gases (argon, ammonia/hydrogen, and acetylene), the substrate temperature, and the radiofrequency power. Scanning and transmission electron microscopy, Raman spectroscopy, and electron diffraction methods were used for the investigation of the deposited material. We found that although materials with various morphologies can be generally obtained, nanostructured carbon material with a 2D morphology is obtained with a specific range of parameter values.