4.4 Article

Measurement of virtual cathode structures in a plasma sheath caused by secondary electrons

Journal

PHYSICS OF PLASMAS
Volume 19, Issue 3, Pages -

Publisher

AIP Publishing
DOI: 10.1063/1.3695395

Keywords

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Funding

  1. National Natural Science Foundation of China [10875121, 11175177]
  2. CAS [kjcx2-yw-n28]
  3. National ITER Program of China [2009GB105001]

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The measured potential profiles of unmagnetized plasma sheath near a stainless steel plate exhibit deep virtual cathode structures caused by secondary electrons produced by high-speed ions hitting the surface of the plate. The depth and thickness of the virtual cathode depend on the ion streaming energy and gas pressure. The experimental results are in agreement with numerical calculations. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3695395]

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