4.8 Article

Transport Properties of a 3D Topological Insulator based on a Strained High-Mobility HgTe Film

Journal

PHYSICAL REVIEW LETTERS
Volume 112, Issue 19, Pages -

Publisher

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevLett.112.196801

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Funding

  1. German Science Foundation (DFG)
  2. SPP 1666
  3. Linkage Grant of IB of BMBF at DLR
  4. Russian Foundation for Basic Research
  5. Ministry of Education and Science of the Russian Federation
  6. Russian Academy of Sciences (Physics and Technology of Nanostructures Program)

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We investigate the magnetotransport properties of strained 80 nm thick HgTe layers featuring a high mobility of mu similar to 4 x 10(5) cm(2/)V . s. By means of a top gate, the Fermi energy is tuned from the valence band through the Dirac-type surface states into the conduction band. Magnetotransport measurements allow us to disentangle the different contributions of conduction band electrons, holes, and Dirac electrons to the conductivity. The results are in line with previous claims that strained HgTe is a topological insulator with a bulk gap of approximate to 15 meV and gapless surface states.

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