4.8 Article

Hydrogen-Free Amorphous Silicon with No Tunneling States

Journal

PHYSICAL REVIEW LETTERS
Volume 113, Issue 2, Pages -

Publisher

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevLett.113.025503

Keywords

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Funding

  1. Office of Naval Research
  2. NSF [DMR-0907724]
  3. U.S. Department of Energy [DE-AC02-05CH11231]
  4. Direct For Mathematical & Physical Scien [0907724] Funding Source: National Science Foundation
  5. Division Of Materials Research [0907724] Funding Source: National Science Foundation

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The ubiquitous low-energy excitations, known as two-level tunneling systems (TLSs), are one of the universal phenomena of amorphous solids. Low temperature elastic measurements show that e-beam amorphous silicon (a-Si) contains a variable density of TLSs which diminishes as the growth temperature reaches 400 degrees C. Structural analyses show that these a-Si films become denser and more structurally ordered. We conclude that the enhanced surface energetics at a high growth temperature improved the amorphous structural network of e-beam a-Si and removed TLSs. This work obviates the role hydrogen was previously thought to play in removing TLSs in the hydrogenated form of a-Si and suggests it is possible to prepare perfect amorphous solids with crystal-like properties for applications.

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