4.8 Article

Thickness-Independent Transport Channels in Topological Insulator Bi2Se3 Thin Films

Journal

PHYSICAL REVIEW LETTERS
Volume 109, Issue 11, Pages -

Publisher

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevLett.109.116804

Keywords

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Funding

  1. IAMDN of Rutgers University
  2. National Science Foundation [NSF DMR-0845464]
  3. Office of Naval Research [ONR N000140910749]

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With high quality topological insulator Bi2Se3 thin films, we report thickness-independent transport properties over wide thickness ranges. Conductance remained nominally constant as the sample thickness changed from 256 to similar to 8 QL(where QL refers to quintuple layer, 1 QL approximate to 1 nm). Two surface channels of very different behaviors were identified. The sheet carrier density of one channel remained constant at similar to 3.0 X 10(13) cm(-2) down to 2 QL, while the other, which exhibited quantum oscillations, remained constant at similar to 8 X 10(12) cm(-2) only down to similar to 8 QL. The weak antilocalization parameters also exhibited similar thickness independence. These two channels are most consistent with the topological surface states and the surface accumulation layers, respectively.

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