4.6 Article

Evolution of electronic structure upon Cu doping in the topological insulator Bi2Se3

Journal

PHYSICAL REVIEW B
Volume 85, Issue 12, Pages -

Publisher

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.85.125111

Keywords

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Funding

  1. JST-CREST
  2. JSPS
  3. MEXT of Japan
  4. MOST
  5. CAS
  6. NSFC of China
  7. University of Wisconsin-Madison
  8. Grants-in-Aid for Scientific Research [23224010, 24654096] Funding Source: KAKEN

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We have performed angle-resolved photoemission spectroscopy of CuxBi2Se3 as a function of Cu doping (x = 0.0-0.25) to investigate the doping-induced evolution of the electronic structure. We found that the topological surface state is preserved even in the heavy-doping region (x = 0.25), indicative of the robustness of the surface state against doping and impurities. The estimated carrier concentration is far smaller than that expected from a simple intercalation picture, and saturates at x similar to 0.1 where superconductivity emerges. This indicates that the carrier concentration responsible for superconductivity is dominated by a subtle balance between two competing processes of electron and hole doping.

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