4.6 Article

PbTiO3/SrTiO3 interface: Energy band alignment and its relation to the limits of Fermi level variation

Journal

PHYSICAL REVIEW B
Volume 84, Issue 4, Pages -

Publisher

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.84.045317

Keywords

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Funding

  1. German Science Foundation (DFG) [SFB 595]

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The interface formation between PbTiO3 and SrTiO3 has been studied by in situ photoelectron spectroscopy. A valence band offset of 1.1 +/- 0.1 eV, corresponding to a conduction band offset of 1.3 +/- 0.1 eV, is determined. These values are in good agreement with the band offsets estimated from measured ionization potentials of SrTiO3 and PbTiO3 surfaces. The observed band offsets are also in line with a similar to 1.1 eV difference in barrier heights of PbTiO3 in contact with different electrode materials as compared to barrier heights of SrTiO3 with the same electrode materials. The results indicate that the band alignment is not strongly affected by Fermi level pinning and that the barrier heights are transitive. The limits of Fermi level variation observed from a number of thin films prepared on different substrates with different conditions are the same for both materials when these are aligned following the experimentally determined band offsets. By further comparing electrical conductivities reported for SrTiO3 and PbTiO3, it is suggested that the range of Fermi level position in the bulk of these materials, which corresponds to the range of observed conductivities, is comparable to the range of Fermi level position at interfaces with different contact materials. In particular the possibly low barrier height for electron injection into SrTiO3 is consistent with the metallic conduction of donor doped or reduced SrTiO3, while barrier heights similar to 1 eV for PbTiO3 are consistent with the high resistivity even at high doping concentrations. The variation of barrier heights at interfaces therefore provides access to the range of possible Fermi level positions in the interior of any, including insulating, materials, which is relevant for understanding defect properties.

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