4.6 Article

Band-gap transition induced by interlayer van der Waals interaction in MoS2

Journal

PHYSICAL REVIEW B
Volume 84, Issue 4, Pages -

Publisher

AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.84.045409

Keywords

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Funding

  1. Priority Research Centers Programs [2009-0093818]
  2. Basic Research Programs [2010-0008842]
  3. National Research Foundation (NRF) of Korea [2009-0064246]
  4. Ministry of Education, Science, and Technology (MEST) [2010-0015363]
  5. POSTECH
  6. MEST in Korea
  7. National Research Foundation of Korea [2009-0093818, 2005-0093840, 2009-0066575, 2009-0064246, 2009-0073117] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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We have investigated the electronic structures of single- and double-layered MoS2, composing of heterojunction structures such as graphene, MoS2, and SiO2 and MoS2 and SiO2, using scanning photoelectron microscopy. Negative shifts of both core levels and valence bands toward the Fermi energy have been observed. In connection with first-principles calculations, we have confirmed that the direct gap of single-layer MoS2 is changed to an indirect gap by stacking additional layers via van der Waals interlayer interactions.

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