Journal
PHYSICAL REVIEW B
Volume 84, Issue 23, Pages -Publisher
AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.84.237301
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Ruffell et al. [Phys. Rev. B 83, 075316 (2011)] have reported that within residual nanoindentations in films of amorphous silicon both Si-III and Si-XII phases exist in the ratio of about 20:80. It is shown here that, in the light of the existing experimental evidence, the material within the residual indentations cannot have the Si-XII phase in it, and instead the material is almost 100% Si-III with possibly a very small fraction of the Si-I phase.
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