4.6 Article

The influence of the film thickness of nanostructured alpha-Fe2O3 on water photooxidation

Journal

PHYSICAL CHEMISTRY CHEMICAL PHYSICS
Volume 11, Issue 8, Pages 1215-1219

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/b811946e

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Funding

  1. Brazilian funding agencies FAPESP/CEPID [98/14324-0]
  2. CNPq

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The present work shows the influence of the film thickness in the optical and photoelectrochemical properties of nanostructured alpha-Fe2O3 thin film. We found that the film thickness has a strong influence on the optical absorption and the results here reported can help in the design of nanostructured alpha-Fe2O3 with superior performance for water photo-oxidation. The results show that the optical property of the hematite film is affected by the film thickness, probably due to the stress induced by the strong interaction between film and substrate. This stress generates defects in the crystal lattice of the hematite film, increasing the (e(-))-(h(+)) recombination process.

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