4.4 Article

Properties of interfaces in amorphous/crystalline silicon heterojunctions

Journal

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssa.200982845

Keywords

-

Funding

  1. Swiss National Science Foundation [SNSF 200020-116630]
  2. University of Neuchatel
  3. Axpo Holding AG, Switzerland

Ask authors/readers for more resources

To study recombination at the amorphous/crystalline Si (a-Si:H/c-Si) heterointerface, the amphoteric nature of silicon (Si) dangling bonds is taken into account. Modeling interface recombination measured on various test structures provides insight into the microscopic passivation mechanisms, yielding an excellent interface defect density reduction by intrinsic a-Si:H and tunable field-effect passivation by doped layers. The potential of this model's applicability to recombination at other Si heterointerfaces is demonstrated. Solar cell properties of a-Si:H/c-Si heterojunctions are in good accordance with the microscopic interface properties revealed by modeling, that are, e.g., slight asymmetries in the neutral capture cross-sections and band offsets. The importance of atomically abrupt interfaces and the difficulties to obtain them on pyramidally textured c-Si is studied in combination with transmission electron microscopy. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available