4.6 Article

Optimization of Al2O3/ZrO2 nanolaminate structure for thin-film encapsulation of OLEDs

Journal

ORGANIC ELECTRONICS
Volume 13, Issue 11, Pages 2436-2441

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.orgel.2012.07.007

Keywords

Nanolaminate; Moisture barrier; WVTR; OLED encapsulation; Ca test

Funding

  1. Kaneka Corporation in Japan
  2. National Research Foundation of Korea (NRF)
  3. Ministry of Education, Science and Technology [2010-0015035]
  4. National Research Foundation of Korea [2009-0093250] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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We report thin-film moisture barriers based on Al2O3/ZrO2 nanolaminates grown by ALD for an encapsulation of OLEDs. In order to optimize the moisture-barrier performance of the nanolaminates, the most important factors affecting the performance were sought by measuring WVTR of the nanolaminates via an electrical Ca test. We found out that both the number of interfaces in the nanolaminates and the thickness of ZrO2 in a unit layer were responsible for the performance. By optimizing the nanolaminate structure, the moisture-barrier performance was enhanced up to 350% from a single layer of the same thickness. The WVTR of 30-nm-thick optimized nanolaminate barrier was 2 x 10(-4) g/(m(2) day) or less at ambient condition. A storage-lifetime measurement of an OLED with a 100-nm-thick encapsulation layer showed that it could exceed 70,000 h if stored at ambient condition. (C) 2012 Elsevier B.V. All rights reserved.

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