Journal
ORGANIC ELECTRONICS
Volume 11, Issue 5, Pages 748-754Publisher
ELSEVIER
DOI: 10.1016/j.orgel.2010.01.014
Keywords
Conducting polymer; Surface energy; Organic field-effect transistors; Nanoscale patterning
Funding
- Ministry of Knowledge Economy (MKE), Korea
- Ministry of Commerce, Industry and Energy (MCIE), Korea
- Korea Science and Engineering Foundation (KOSEF) [R15-2008-006-03002-0]
- Program for Integrated Molecular System at GIST
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We developed a new conducting polymer microscale and nanoscale patterning method; a bottom-up approach for applying a conducting polymer solution on a substrate with locally varied surface energies. Selective surface energy engineering was achieved by combining conventional photolithography and local hydrophobic treatments with a self-assembled monolayer (SAM) at the exposed surface. The regions under the photoresist patterns remained hydrophilic after the photoresist removal. Here, a poly(3,4-ethylenedioxythiophene): poly(styrene sulfonate) (PEDOT:PSS) conducting polymer solution was dispensed with a razor blade on the substrate, wetting only the hydrophilic regions. Next, conducting source/drain polymer electrodes were fabricated (channel length: 5 mu m) and utilized for poly(3-hexylthiophene) (P3HT) organic field-effect transistors. For nanoscale conducting polymer line patterns, a photoresist template with nanoscale features was fabricated using holographic lithography. Finally, multi-step spin coating method reliably produced polymer lines having a linewidth of 292 nm at 1 mu m spacing. (C) 2010 Elsevier B. V. All rights reserved.
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