Journal
OPTICS LETTERS
Volume 38, Issue 23, Pages 5067-5070Publisher
OPTICAL SOC AMER
DOI: 10.1364/OL.38.005067
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Funding
- The Kyoto Technoscience Center
- The Center for Collaborative Research and Technology Development (CREATE) of Kobe University
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A terahertz (THz) wire-grid polarizer is fabricated by imprinting porous Si followed by oblique evaporation of Ag. We demonstrate that it works in a wide frequency region covering from 5 to 18 THz with the extinction ratio of 10 dB. The frequency region is much wider than that of THz wire-grid polarizers fabricated by conventional imprint lithography using organic materials. The result suggests that imprinting of porous Si is a promising fabrication technique to realize low-cost wire-grid polarizers working in the THz region. (C) 2013 Optical Society of America
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