4.6 Article

All-dielectric subwavelength metasurface focusing lens

Journal

OPTICS EXPRESS
Volume 22, Issue 21, Pages 26212-26221

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OE.22.026212

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Funding

  1. U.S. Army Research Office (ARO) [63133-PH (W911NF-13-1-0226)]
  2. ARO Multidisciplinary University Research Initiative (MURI) [56154-PH-MUR (W911NF-09-1-0539)]
  3. Air Force Office of Scientific Research (AFOSR) MURI

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We have proposed, designed, manufactured and tested low loss dielectric micro-lenses for infrared (IR) radiation based on a dielectric metamaterial layer. This metamaterial layer was created by patterning a dielectric surface and etching to sub-micron depths. For a proof-of-concept lens demonstration, we have chosen a fine patterned array of nano-pillars with variable diameters. Gradient index (GRIN) properties were achieved by engineering the nano-pattern characteristics across the lens, so that the effective optical density of the dielectric metamaterial layer peaks around the lens center, and gradually drops at the lens periphery. A set of lens designs with reduced reflection and tailorable phase gradients have been developed and tested, demonstrating focal distances of a few hundred microns, beam area contraction ratio up to three, and insertion losses as low as 11%. (C) 2014 Optical Society of America

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