4.6 Article

1.3-μm InAs/GaAs quantum-dot lasers monolithically grown on Si substrates using InAlAs/GaAs dislocation filter layers

Journal

OPTICS EXPRESS
Volume 22, Issue 10, Pages 11528-11535

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OE.22.011528

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Funding

  1. UK EPSRC [EP/J012904/1]
  2. Royal Society
  3. EPSRC [EP/J012904/1] Funding Source: UKRI
  4. Engineering and Physical Sciences Research Council [EP/J012904/1] Funding Source: researchfish
  5. Direct For Mathematical & Physical Scien
  6. Division Of Materials Research [1008107] Funding Source: National Science Foundation

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We compare InAlAs/GaAs and InGaAs/GaAs strained-layer superlattices (SLSs) as dislocation filter layers for 1.3-mu m InAs/GaAs quantum-dot laser structures directly grown on Si substrates. InAlAs/GaAs SLSs are found to be more effective than InGaAs/GaAs SLSs in blocking the propagation of threading dislocations generated at the interface between the GaAs buffer layer and the Si substrate. Room-temperature lasing at similar to 1.27 mu m with a threshold current density of 194 A/cm(2) and output power of similar to 77 mW has been demonstrated for broad-area lasers grown on Si substrates using InAlAs/GaAs dislocation filter layers. (C) 2014 Optical Society of America

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