4.6 Article

120 nm resolution and 55 nm structure size in STED-lithography

Journal

OPTICS EXPRESS
Volume 21, Issue 9, Pages 10831-10840

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OE.21.010831

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  1. Deutsche Forschungsgemeinschaft (DFG) [KL1432/5-1, SPP 1327]

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Two-photon direct laser writing (DLW) lithography is limited in the achievable structure size as well as in structure resolution. Adding stimulated emission depletion (STED) to DLW allowed overcoming both restrictions. We now push both to new limits. Using visible light for two-photon DLW (780 nm) and STED (532 nm), we obtain lateral structure sizes of 55 nm, a Sparrow limit of around 100 nm and we present two clearly separated lines spaced only 120 nm apart. The photo-resist used in these experiments is a mixture of tri- and tetra-acrylates and 7-Diethylamino-3-thenoylcoumarin as a photo-starter which can be readily quenched via STED. (C) 2013 Optical Society of America

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