Journal
OPTICS EXPRESS
Volume 20, Issue 15, Pages 16436-16449Publisher
OPTICAL SOC AMER
DOI: 10.1364/OE.20.016436
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Funding
- NASA
- II-VI Foundation
- NYSTAR Foundation [C050070]
- National Science Foundation [EECS-1002179]
- Directorate For Engineering
- Div Of Electrical, Commun & Cyber Sys [1002179] Funding Source: National Science Foundation
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Zernike polynomials have emerged as the preferred method of characterizing as-fabricated optical surfaces with circular apertures. Over time, they have come to be used as a sparsely sampled in field representation of the state of alignment of assembled optical systems both during and at the conclusion of the alignment process using interferometry. We show that the field dependence of the Zernike polynomial coefficients, which has to-date been characterized essentially by aperture dependence, can be introduced by association to the field dependent wave aberration function of H.H. Hopkins. (C) 2012 Optical Society of America
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