Journal
OPTICS EXPRESS
Volume 20, Issue 6, Pages 6185-6190Publisher
OPTICAL SOC AMER
DOI: 10.1364/OE.20.006185
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Funding
- DFG [SE 1911/1-1]
- TMBWK [B 715-08008]
- FSU [ProChance 2009 A1]
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We report on the realization of an intracavity high harmonic source with a cutoff above 30 eV. The EUV source is based on a high power, hard-aperture, Kerr-lens mode-locked Ti:sapphire oscillator with a repetition rate of 9.4 MHz. The laser is operated in the net negative dispersion regime resulting in intracavity pulses as short as 17 fs with 1 mu J pulse energy. In a second intracavity focus, intensity more than 10(14) W/cm(2) has been achieved, which is sufficient for high harmonic generation in a Xenon gas jet. (C) 2012 Optical Society of America
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